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Gadolinium oxide sputtering targets(Gd2O3)

Gadolinium oxide sputtering targets(Gd2O3)
  • Gadolinium oxide sputtering targets(Gd2O3)
Gadolinium oxide sputtering targets(Gd2O3)essential information
Molecular formulaGd2O3
purity99.9%
CAS No12064-62-9
Molar mass362.50
density7.407 g/cm3
melting point2420 °C
boiling point
Solubility (water)Insoluble in water, soluble in acid

Gadolinium oxide sputtering targets(Gd2O3)Product overview

Gadolinium oxide (Gd2O3) thin films have the characteristics of high resistivity, high dielectric constant and wide band gap


Gadolinium oxide sputtering targets(Gd2O3)Product application

Used as yttrium aluminum and yttrium iron garnet admixtures, sensitized fluorescent materials in medical devices, nuclear reactor control materials, raw materials for the preparation of gadolinium metal, magnetic bubble materials and optical prism additives

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