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Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.

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Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)

Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)
  • Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)
Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)essential information
Molecular formulaNiO-Cr2O3-Ni
purity99.9%
CAS No
Molar mass
density
melting point
boiling point
Solubility (water)

Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)Product overview

Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)Product application

Chromium oxide (Cr2O3) thin film is a kind of transition metal oxide semiconductor, which has been widely studied in series solar cell electrodes and cathode materials for solar water electrolysis. In addition, chromium oxide is widely used as the surface material of solar collectors due to its high hardness and strong thermal stability. However, the problems of high resistivity (near insulator) and weak photoelectric response of chromic oxide film generally restrict its application in photoelectric functional materials. The photoelectric response of Cr2O3 film can be greatly improved by doping Ni and NiO.

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