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Oxide Sputtering Targets DeselectBismuth oxide sputtering targets(Bi2O3)essential information | |
Molecular formula | Bi2O3 |
purity | 99.99% |
CAS No | 1304-76-3 |
Molar mass | 465.959 |
density | 8.9 g/cm³ |
melting point | 825 ℃ |
boiling point | 1890 ℃ |
Solubility (water) | Soluble in acid, insoluble in water |
Bismuth oxide has high reflection coefficient, dielectric constant, remarkable photoelectric properties and is easy to be excited by light
Bismuth oxide sputtering targets(Bi2O3)Product application |
Bismuth oxide thin films are widely used in electronic ceramic materials, electrolyte materials, photoelectric materials, high temperature superconducting materials, photocatalysts, nuclear waste absorption materials, shadow mask coatings for picture tubes, solid oxide fuel cells, oxygen sensors, varistors, electrochromism and other fields.