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Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.

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Tin monoxide sputtering targets(SnO)

Tin monoxide sputtering targets(SnO)
  • Tin monoxide sputtering targets(SnO)
Tin monoxide sputtering targets(SnO)essential information
Molecular formulaSnO
purity99.99%
CAS No21651-19-4
Molar mass134.709
density6.45 g/cm3
melting point1080 °C
boiling point
Solubility (water)不溶于水

Tin monoxide sputtering targets(SnO)Product overview

Tin monoxide sputtering targets(SnO)Product application

Tin monoxide is a metastable metal oxide semiconductor. Its Sn vacancy formation energy is low, and it is easy to form p-type conduction. It has good semiconductor characteristics. At temperatures of 220 ° C and below, SnO can exist stably in the air. Its proper band gap structure and good stability enable it to be used as a photocatalyst material for environmental purification, and can be used for photocatalytic degradation of organic pollutants; SnO also has good performance in energy storage, its theoretical specific capacity is high, and it has good pseudo-capacitor performance when making supercapacitors.

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Sputtering Targets
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Compound Semiconductor Materials
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