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氧化铪靶材(HfO2)essential information | |
Molecular formula | HfO2 |
purity | 99.95% |
CAS No | 12055-23-1 |
Molar mass | 210.4888 |
density | 9.68 g/cm³ |
melting point | 2758 ℃ |
boiling point | 5400 ℃ |
Solubility (water) | 难溶于水 |
热压陶瓷靶材。
薄膜特性:透光范围~220~12000nm;折射率(250nm)~2.15 (500nm)~2
氧化铪靶材(HfO2)Product application |
UV增透膜,干涉膜