Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.
钽掺氮化硼靶材(Ta-BN)essential information | |
Molecular formula | Ta-BN |
purity | 99.9% |
CAS No | |
Molar mass | |
density | |
melting point | |
boiling point | |
Solubility (water) |
钽掺氮化硼靶材(Ta-BN)Product application |
高纯钽溅射靶材广泛应用于电子信息产品制造业中,钽可作为集成电路中铜与硅基板的阻隔层材料,以防止铜与硅扩散生成铜硅合金影响电路性能,采用钽靶材通过物理气相沉积技术溅射钽到硅片上。掺杂的氮化硼薄膜具有、介电常数小、寄生电容小、工作温度高、抗高能粒子辐射、耐腐蚀等优点,且材料的击穿电压较高,使得器件更适合在高温、强辐射等恶劣环境下稳定工作。