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Special Sputtering Targets Customization DeselectNiobium doped titanium dioxide sputtering targets(TiO2-Nb)essential information | |
Molecular formula | TiO2-Nb |
purity | 99.9% |
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Niobium doped titanium dioxide sputtering targets(TiO2-Nb)Product application |
Transparent and conductive niobium doped titanium dioxide (TNO) has good electrical conductivity and high transmittance in the visible light band. It is compatible with standard semiconductor manufacturing processes and is easy to prepare films and various other nanostructures. Niobium doped titanium dioxide transparent conductive oxide (TCO) thin films can have negative dielectric constants in the near infrared (NIR) band, lower losses, and good adjustability compared to traditional noble metal plasma materials. It is expected to become a new type of low loss plasma material that can replace traditional metals.