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Niobium doped titanium dioxide sputtering targets(TiO2-Nb)

Niobium doped titanium dioxide sputtering targets(TiO2-Nb)
  • Niobium doped titanium dioxide sputtering targets(TiO2-Nb)
Niobium doped titanium dioxide sputtering targets(TiO2-Nb)基本信息
分子式TiO2-Nb
纯度99.9%
CAS号
摩尔质量
密度
熔点
沸点
溶解性(水)

Niobium doped titanium dioxide sputtering targets(TiO2-Nb)产品概况

Niobium doped titanium dioxide sputtering targets(TiO2-Nb)产品应用

Transparent and conductive niobium doped titanium dioxide (TNO) has good electrical conductivity and high transmittance in the visible light band. It is compatible with standard semiconductor manufacturing processes and is easy to prepare films and various other nanostructures. Niobium doped titanium dioxide transparent conductive oxide (TCO) thin films can have negative dielectric constants in the near infrared (NIR) band, lower losses, and good adjustability compared to traditional noble metal plasma materials. It is expected to become a new type of low loss plasma material that can replace traditional metals.

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