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Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.

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Titanium nitride sputtering targets(TiN)

Titanium nitride sputtering targets(TiN)
  • Titanium nitride sputtering targets(TiN)
Titanium nitride sputtering targets(TiN)essential information
Molecular formulaTiN
purity99.5%
CAS No25583-20-4
Molar mass
density5.22 g/cm3
melting point2930 °C
boiling point
Solubility (water)

Titanium nitride sputtering targets(TiN)Product overview

Titanium nitride sputtering targets(TiN)Product application

Titanium nitride film can reduce the adhesion of cutting edge materials, improve the cutting force, improve the surface quality of the workpiece, and multiply the service life and durability of cutting tools. Therefore, TiN thin film barium is widely used for coating cutting tools, cutters and drill bits. TiN is also an ideal wear-resistant coating for wear parts, and is widely used in tool coating of molding technology. TiN film is non-toxic, light in weight, high in strength, and has excellent biocompatibility. Therefore, it is a very ideal medical metal material, which can be used as an implant for human body, as well as as a surgical device. The titanium nitride film can also be used as a reinforcing film of excellent biocompatible film. In addition, the attractive gold surface of TiN film is often used in the decoration industry.

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