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Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.

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Vanadium oxide sputtering targets V2Ox(x≈3)

Vanadium oxide sputtering targets V2Ox(x≈3)
  • Vanadium oxide sputtering targets V2Ox(x≈3)
Vanadium oxide sputtering targets V2Ox(x≈3)essential information
Molecular formulaV2Ox(x≈3)
purity99.9%
CAS No
Molar mass
density
melting point
boiling point
Solubility (water)

Vanadium oxide sputtering targets V2Ox(x≈3)Product overview

Vanadium oxide sputtering targets V2Ox(x≈3)Product application

Vanadium oxide is a metal-insulator transition (MIT) phase change material. When the temperature reaches 68 ℃, the first order phase transition from room temperature monoclinic insulation phase (M1) to high temperature rutile metal phase (R) will occur. The phase change of vanadium oxide is accompanied by sudden changes in physical properties such as electricity and optics. Due to its excellent phase change characteristics, it is widely used in switch modulation, optoelectronic devices, smart windows, sensors, drivers, infrared radiation, infrared thermal imagers and other fields. Vanadium oxide film is also a common semiconductor thermal sensitive film.

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Sputtering Targets
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