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Alloy Sputtering Targets DeselectTungsten silicon alloy sputtering targets(WSi)essential information | |
Molecular formula | W-Si |
purity | 99.9% |
CAS No | |
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density | |
melting point | |
boiling point | |
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Tungsten silicon alloy sputtering targets(WSi)Product application |
Tungsten silicon thin films have the characteristics of low resistivity, strong thermal stability, and excellent resistance to chemical corrosion. They are important components of semiconductor integrated circuits, and are mainly used as gate contact layers, diffusion barrier layers, or adhesive layers.